OSRAM utilizes the Quantus SNA workflow for high-precision silicon.
In modern semiconductor design, Heterogeneous Integration is the new frontier. When light detectors for Medical Imaging or depth sensors for Autonomous Systems are packed onto a single die alongside radio systems, the risk of interference skyrockets.
For ams OSRAM, “sensing the power of light” means more than just detection; it means controlling the Coupling Path of every signal. This requires modeling the Silicon substrate itself as a significant element of the circuit to ensure that Electrical Interactions do not degrade performance.
To solve these complex problems, engineers rely on the Quantus SNA and SND Workflow. This process enables a level of precision that was previously manual and error-prone:
- Substrate Modeling : The workflow models the physical behavior of the substrate using a simplified RC Network. This simplification is key to achieving Simulation Speed without sacrificing the accuracy needed for complex RF Substrate Noise Effects.
- Seamless Back-Annotation : Once noise is visualized and modeled, it is directly back-annotated into the Spice Netlist. This allows designers to see exactly how substrate noise will impact the final circuit behavior.
- Database Management: By managing the entire Design Database within the Virtuoso Environment, the workflow enables layout engineers to perform critical analysis independently, reducing the bottleneck traditionally caused by a single simulation expert.
Also Ask Questions (FAQ)
- Why is modeling coupling paths vital? The video states that modeling coupling paths is vital because it’s necessary to manage the electrical interactions between coexisting systems, such as a sensor on a flexible printed circuit board and a radio system. By modeling every element of the coupling path, they can characterize the device’s sensitivity or control the coupling itself.
- How does Quantus SNA workflow empower engineers? According to the video, the Quantus SNA and SND workflow empowers design and layout engineers by enabling them to perform critical analyses by themselves. This means they do not require the constant involvement of an RF (AM) simulation expert. This workflow achieves this by allowing engineers to model and visualize RF substrate noise effects, directly back-annotating them into the spice netlist, and by managing the entire design database, including layout and substrate information.
- What future visualization improvements are desired? The video mentions the desire for a better and more advanced visualization of RF fields. This includes gaining access to voltage, currents, and phase information to better understand the internal workings of the IC.
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